Reaction Path Analysis for Atomic Layer Deposition Processes

Title of Document : SENSOR BASED ATOMIC LAYER DEPOSITION FOR RAPID PROCESS LEARNING AND ENHANCED

Title of Document: SENSOR BASED ATOMIC LAYER DEPOSITION FOR RAPID PROCESS LEARNING AND ENHANCED MANUFACURABILITY Wei Lei, Doctor of Philosophy, 2006 Directed By: Professor Gary W. Rubloff Department of Materials Science and Engineering and the Institute for Systems Research In the search for sensor based atomic layer deposition (ALD) process to accelerate process learning and enhance manufactur...

Analytic expressions for atomic layer deposition: Coverage, throughput, and materials utilization in cross-flow, particle coating, and spatial atomic layer deposition

In this work, the authors present analytic models for atomic layer deposition (ALD) in three common experimental configurations: cross-flow, particle coating, and spatial ALD. These models, based on the plug-flow and well-mixed approximations, allow us to determine the minimum dose times and materials utilization for all three configurations. A comparison between the three models shows that thr...

In Situ Reaction Mechanism Studies on Atomic Layer Deposition

Stepwise mechanism and H2O-assisted hydrolysis in atomic layer deposition of SiO2 without a catalyst

Atomic layer deposition (ALD) is a powerful deposition technique for constructing uniform, conformal, and ultrathin films in microelectronics, photovoltaics, catalysis, energy storage, and conversion. The possible pathways for silicon dioxide (SiO2) ALD using silicon tetrachloride (SiCl4) and water (H2O) without a catalyst have been investigated by means of density functional theory calculation...

Nucleation and growth process of atomic layer deposition platinum nanoparticles on strontium titanate nanocuboids.

Uniform, well-dispersed platinum nanoparticles were grown on SrTiO3 nanocuboids via atomic layer deposition (ALD) using (methylcyclopentadienyl)trimethylplatinum (MeCpPt(Me)3) and water. For the first half-cycle of the deposition particles formed through two sequential processes: initial nucleation and growth. The final particle size after a single complete ALD cycle was dependent on the reacti...